Appendix
16. A developer solution for an actinic ray-sensitive resist
layer which comprises:
(a) water or a liquid mixture mainly composed of water as
a solvent;
(b) a nitrogen-containing organic basic compound
dissolved in said solvent in a concentration of from 1 to 5%
by weight; and
(c) an anionic surface active agent which is a diphenyl
ether compound
represented by the
general formula:
in which R is an alkyl or alkoxy group having 5 to 18 carbon1
atoms, R is a hydrogen atom or an alkyl or alkoxy group2
having
5 to 18 carbon atoms, R is an N-substituted or unsubstituted3
ammonium sulfonate group of the general formula -SO NH , and R3 4 4
and R are each a hydrogen atom or an N-subsitited or5
unsbsititued ammonium group of the general formula
-SO NH ,
3 4
4 5
and R and R are each a hydrogen atom or an N-substituted or
unsubstituted ammonium sulfonate group of the general formula
-SO NH , dissolved in the solvent in a concentration in the
3 4
range from 0.05 to 5% by weight.
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Last modified: November 3, 2007