Ex parte KIHARA et al. - Page 15




                Appeal No. 1998-2147                                                                                                       
                Application No. 08/247,356                                                                                                 


                 available in the art would have led one of ordinary skill in the art to arrive at the                                     

                 claimed invention.  Pro-Mold & Tool Co. v. Great Lakes Plastics, Inc., 75 F.3d 1568,                                      

                 1573, 37 USPQ2d 1626, 1630 (Fed. Cir. 1996).                                                                              

                          According to the Examiner, Uenishi ‘389 and ‘582 teach photosensitive                                            

                 alkali-soluble novolak composition comprising the claimed acid-decomposable                                               

                 compound.  The Examiner urges Crivello, Nguyen-Kim and Elsaesser teach the claimed                                        

                 chemical amplification photosensitive composition except for specifically teaching                                        

                 the claimed acid-decomposable compound.  The Examiner concludes “[o]ne of ordinary                                        

                 skill in the art would have been motivated to make this substitution because of the                                       

                 teaching of Uenishi et al. [sic, ‘389 or ‘582] that these compounds provide resists                                       

                 which are capable of forming a pattern with vertical side walls, have broad development                                   

                 latitude, and provide resist images with excellent heat resistance.”  (Examiner’s                                         

                 Answer, page 14, third paragraph).                                                                                        

                         We disagree with the Examiner’s factual basis underlying this rationale to                                       

                 establish prima facie obviousness.  The light sensitive material of Uenishi ‘389 and                                      

                 ‘582 is sensitive to actinic radiation because of the reaction of a novolak resin with at                                 

                 least one 1,2-quinone diazide group.  (‘389, column 2 lines 11-31; ‘582, column 4,                                        

                 lines 50-55).   Uenishi ‘389 and ‘582 do not describe a component which generates an                                      


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