Appeal No. 1998-2147
Application No. 08/247,356
Cited References
Crivello discloses photosensitive compositions comprising a combination of
(i) a compound which generates an acid when exposed to activating radiation and (ii) a
compound (dissolution inhibitor) which contains acid cleavable groups. (See pages 2-
5). The dissolution inhibitor is decomposed by acid liberated from an onium salt,
when the composition is exposed to radiation.
Nguyen-Kim discloses photosensitive compositions comprising a combination
of (i) a compound which generates an acid when exposed to activating radiation, (ii) a
compound (dissolution inhibitor) which contains acid cleavable groups and (iii) a
binder. (Column 2, lines 28-56). The dissolution inhibitor compound (ii) ester groups
are decomposed by the acid liberated from the compound (i). (Column 5, line 55 to
column 6, line 58).
Elsaesser discloses positive photosensitive compositions comprising a
combination of (i) a compound which generates an acid when exposed to activating
radiation and (ii) a compound (dissolution inhibitor) which contains acid cleavable
groups. (Column 2, lines 12-36). The dissolution inhibitor composition is a 1,2-
quinone diazide compound and/or a combination of a compound which forms a strong
acid when exposed to actinic radiation and a compound containing at least one acid
-5-
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