Appeal No. 1998-2147
Application No. 08/247,356
37. A chemical amplification photosensitive composition,
comprising:
an alkali-soluble polyvinylphenol resin having a softening point of
at least 160oC and a weight average molecular weight which is no less
than 3,000 and exceeds 8,000 only when the photosensitive composition
containing the resin has sufficient photosensitivity and forms a resist
pattern which has sufficient resolution;
an acid-decomposable compound; and
a compound which generates an acid when exposed to a chemical
radiation.
As evidence of obviousness, the Examiner relies on the following references:
Nguyen-Kim et al. (Nguyen-Kim) 5,035,979 Jul. 30 , 1991
Uenishi et al. (Uenishi ‘389) 5,173,389 Dec. 22, 1992
(Filed Apr. 26, 1990)
Uenishi et al. (Uenishi ‘582) 5,248,582 Sept. 28, 1993
(Filed Dec. 8, 1992)
Elsaesser et al. (Elsaesser) 5,376,496 Dec. 27, 1994
(Filed Jan. 30, 1991)
Crivello et al. (Crivello) EP 0249139 Dec. 16, 1987
European Patent Application
THE REJECTIONS
The Examiner entered the following grounds of rejection:
-3-
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