Appeal No. 1998-2147
Application No. 08/247,356
cleavable C-O-C bond. (Column 5, line 50 to column 6, line 31). Thus, the
dissolution inhibitor contains at least one acid-cleavable ether bond which is
decomposed by the acid liberated from the acid generating compound.
Uenishi ‘389 and ‘582 disclose positive type photosensitive compositions
comprising a binder and a photosensitive dissolution inhibitor. The dissolution
inhibitor contains a multi-aromatic ring compound, which contains a cyclic ring
system constituted of heteroatoms and quinone diazide radicals. (‘389, column 2 line
36 to column 8, line 24; ‘582 column 2, line 34 to column 3, line 68). Uenishi
discloses quinone diazide dissolution inhibitor compounds produce an alkali-soluble
substance when irradiated with light to undergo decomposition. (‘389, column 1
lines 30-35; ‘582 column 1, lines 50-57). Uenishi does not disclose the presence of a
compound which forms an acid upon exposure to radiation or that the dissolution
inhibitor contains groups which are cleaved by an acid.
OPINION
We have carefully reviewed the claims, specification and applied prior art,
including all of the arguments advanced by both the Examiner and Appellants in support
of their respective positions. This review leads us to conclude that only the § 112,
first paragraph, rejection is well founded. Accordingly, we will sustain the § 112, first
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