Appeal No. 1998-2951
Application No. 08/675,692
the teachings of Tanaka to Gonzalez's polysilicon layer, since
polysilicon is the top layer of Gonzalez's bottom electrode as in
Tanaka's device and is the same material roughened by Tanaka. There
would have been no reason also to roughen the tungsten of Gonzalez.
Accordingly, the combination of Gonzalez and Tanaka fails to meet the
claim limitation that the tungsten has recessed and elevated
portions.
In addition, as pointed out by appellants (Brief, page 6),
claims 28 and 29 recite that the second (or tungsten) layer covers an
entire exposed surface of the first (or titanium nitride) layer,
whereas Gonzalez's tungsten layer covers only a small portion of the
exposed surface of the titanium nitride. Hence, the combination of
references fails to meet yet another limitation of the claims.
Consequently, we cannot affirm the rejection of claims 28 and 29 nor
of claims 31 through 38, which depend therefrom.
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