Appeal No. 1999-2117
Application No. 08/795,197
power corresponding to a discontinuous change of certain
parameters. Specifically, the aforementioned
discontinuous change relates to (1) a characteristic line
of electron density or saturated ion density as a
function of a power source or (2) a gradient of a
straight line approximately linearized to a
characteristic line of electron density or saturated ion
current density as a function of a source power. This
appealed subject matter is adequately illustrated by
independent claims 1 and 4 which read as follows:
1. A plasma processing method using helicon
wave excited plasma comprising the steps of:
controlling dissociation of a processing gas by
setting an applied source power lower than a source
power corresponding to a discontinuous change on a
characteristic line of electron density or saturated
ion current density as a function of a power source.
4. A plasma processing method using a helicon
wave excited plasma comprising the steps of:
controlling dissociation of a processing gas by
setting an applied source power lower than a source
power corresponding to a discontinuous change in a
gradient of a straight line approximately
linearized to a characteristic line of electron
density or saturated ion current density as a
function of a source power.
2
Page: Previous 1 2 3 4 5 6 7 8 Next
Last modified: November 3, 2007