Appeal No. 1999-2117
Application No. 08/795,197
columns 14 and 15) rather than by setting an applied
source power lower than a source power corresponding to
the discontinuous change defined by the appealed
independent claims.
At most, the applied references reflect that the
prior art recognized the existence of the here-claimed
parameters involving a discontinuous change relating to a
characteristic line of electron density or saturated ion
current density as a function of a power source.
However, we perceive nothing and the examiner points to
nothing in these references which evinces a recognition
in the prior art that such a parameter would be effective
in achieving the appellant’s claimed goal of controlling
dissociation of a processing gas in a plasma processing
method using helicon wave excited plasma. Compare In re
Antonie, 559 F.2d 618, 620, 195 USPQ 6, 8-9 (CCPA
1977).
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