Appeal No. 1999-2117
Application No. 08/795,197
The references relied upon by the examiner as
evidence
of obviousness are:
Campbell et al. (Campbell) 5,421,891 Jun. 6,
1995
Sakai et al. (Sakai) 5,503,901 Apr. 2,
1996
Amorim et al. (Amorim), “High-density plasma mode of an
inductively coupled radio frequency discharge,” 9 J. Vac.
Sci. Technol. B, No. 2, pp. 362-65 (Am. Vacuum Society,
Mar./Apr. 1991).
Nakano et al. (Nakano), 61 Helicon wave excited plasmas,
No. 7, pp. 711-17 (1992).
Sugai, “Recent Development of Plasma Sources for Thin
Films Processing,” Proceedings of The 12th Symposium on
Ion Beam Technology Hosei University, pp. 15-20 (December
10-11, 1993).
All of the appealed claims stand rejected under 35
U.S.C. § 103 as being unpatentable over various
combinations
of the above-listed references.
We refer to the brief and to the answer for a
complete
exposition of the opposing viewpoints expressed by the
appellant and by the examiner concerning the above-noted
rejections.
OPINION
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