Ex parte HA et al. - Page 1




               The opinion in support of the decision being                           
               entered today was not written for publication                          
               in a law journal and is not binding precedent                          
               of the Board.                                                          
                                                               Paper No. 17           


                      UNITED STATES PATENT AND TRADEMARK OFFICE                       
                                                                                     
                          BEFORE THE BOARD OF PATENT APPEALS                          
                                  AND INTERFERENCES                                   
                                                                                     
                          Ex parte JAE HEE HA, DONG HYEN YI                           
                                  and MYUNG HO YIM                                    
                                                                                     
                                Appeal No. 2000-1848                                  
                             Application No. 08/810,920                               
                                                                                     
                                      ON BRIEF                                        
                                                                                     

          Before KIMLIN, KRATZ and PAWLIKOWSKI, Administrative Patent                 
          Judges.                                                                     
          KIMLIN, Administrative Patent Judge.                                        


                                 DECISION ON APPEAL                                   
               This is an appeal from the final rejection of claims 1-4,              
          6-18 and 20, all the claims remaining in the present                        
          application.  Claim 1 is illustrative:                                      
               1.  A method of etching a photoresist layer, comprising                
          the steps of:                                                               

                                         -1-                                          




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