Appeal No. 2001-1559
Application No. 09/237,174
Similarly, Bohr discloses a process for forming a deep,
narrow trench within a shallow wide trench wherein both parts are
filled with isolation material. More specifically, as depicted
in figures 3d and 3e, Bohr fills both shallow trench 241 and deep
trench 242 simultaneously using a CVD process with a TEOS-based
chemistry (col. 7, lines 19-40). Kameyama and Bertagnolli also
disclose deep trench isolation wherein CVD oxide is used for
filling the trenches. Although Bohr mentions TEOS-based
chemistry which may use an oxygen (O2) activated process and
Kameyama and Bertagnolli refer to CVD oxide deposition, we find
nothing in these references that would have taught or suggested
an ozone-activated CVD process for filling trenches having the
claimed height to width ratio.
We also note that the Examiner does not point to any
particular part of the prior art that may relate to the claimed
ozone-activated CVD process or the width to height ratio in
relation to the growth rate of the isolation material, nor can we
find any relevant teachings in the references. In that regard,
Sasaki, Bohr, Kameyama and Bertagnolli only refer to using CVD
oxide to fill isolation trenches while nothing in the admitted
prior art points to the use of ozone-activated CVD process for
filling the trenches. Thus, even assuming, arguendo, that proper
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