Ex Parte BIRANG et al - Page 6




              Appeal No. 2002-1025                                                                  Page 6                
              Application No. 09/454,354                                                                                  


                     We therefore conclude that the combined teachings of Brunelli and Duescher fail                      
              to establish a prima facie case of obviousness with regard to the subject matter recited                    
              in claim 1, and we will not sustain the rejection of claim 1 or, it follows, of claims 2-16,                
              which are dependent therefrom.                                                                              
                     Independent apparatus claim 17, which reads as follows, also stands rejected on                      
              the basis of Brunelli and Duescher.                                                                         
                     17. An apparatus for chemical-mechanical polishing a workpiece, the                                  
                     apparatus comprising:                                                                                
                     a fixed abrasive element; and                                                                        
                     a dispenser for dispensing hot water onto the fixed abrasive element.                                
                     It should be recognized at the outset that this claim is not directed to                             
              preconditioning a pad.  Brunelli discloses a fixed abrasive element for planarizing a                       
              workpiece, as well as a system for periodically removing from the abrasive element                          
              waste material accumulated thereon during the planarizing operation.  This waste is                         
              removed by contacting the fixed abrasive element (polishing pad) with a conditioning                        
              disk either concurrently with the planarization operation or in a separate step (column 5,                  
              lines 41-46).  The conditioning operation “is expedited by supplying the planarizing liquid                 
              244 to the planarizing surface 242 during conditioning,” which “augments the                                
              conditioning disk” (column 6, lines 3-5).  The planarizing liquid is disclosed as being “a                  
              solution having no additives, or it may be a slurry having abrasives and/or chemical                        
              agents” (column 5, lines 1-3), which may be heated in a vessel and then directed                            







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