Interference No. 104,785
Page No. 3
would be directed to photoresist compositions containing addition polymers comprising
polycyclic repeating units polymerized from maleimide(s) wherein at least a portion of the
polycyclic repeating units contained pendant acid labile groups.
II. Takechi’s Revised Proposed Amendment
As declared, Takechi’s claims are generally directed to resist materials and methods for
forming a resist pattern. (Takechi Clean Copy of Claims, Paper No. 3, see, e.g., claims 1 and 6).
The claims generally require the presence of a polymer formed by ring-opening metathesis
polymerization (“ROMP”). (Takechi, U.S. Application No. 09/800,227, Specification, p. 6, lines
3-30). Takechi’s Revised Proposed Amendment further defines the polymers, but does not alter
the fact that the polymers are formed via a ROMP process. (Paper No. 28). Indeed, Takechi
seeks to add new claim 14 to the application stating that the claim “recites a polymer or
copolymer with a structure corresponding to ROMP polymers, which are not hydrogenated.”
(Paper No. 28, p. 6). Takechi states that the support for the new claim is provided by a passage
in the specification, which states that the “resin is easily obtained by performing a ring-opening
polymerization and a hydriding reaction following the ring-opening polymerization.” (Paper No.
28, p. 7). Takechi also notes that new claim 14 is supported by the specification’s teaching and
depiction of the unhydrogenated polymers on p. 6 of Takechi’s specification.
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