The opinion in support of the decision being entered today was not written for publication and is not binding precedent of the Board. Paper No. 20 UNITED STATES PATENT AND TRADEMARK OFFICE _____________ BEFORE THE BOARD OF PATENT APPEALS AND INTERFERENCES _____________ Ex parte DANIEL VINCENT ROWLAND _____________ Appeal No. 2001-2085 Application No. 09/104,409 ______________ ON BRIEF _______________ Before KRASS, BARRY and BLANKENSHIP, Administrative Patent Judges. KRASS, Administrative Patent Judge. DECISION ON APPEAL This is a decision on appeal from the final rejection of claims 13, 16 and 17. Claims 14 and 15 have been indicated by the examiner as being directed to allowable subject matter and form no part of this appeal. The invention is directed to a method for monitoring a temperature in a rapid thermal processing (RTP) step. In particular, the silicidation reaction of a cobalt film on silicon is utilized by measuring the cobalt film prior to thermal processing and the resultant cobalt silicide sheet resistance after thermal processing to determine accurately the reaction temperature at the cobalt/silicon interface. 1Page: 1 2 3 4 5 6 7 8 NextLast modified: November 3, 2007