Appeal No. 2001-2146
Application No. 09/270,588
photoexposing the processed patterned positive photoresist layer to form a
photoexposed processed patterned positive photoresist layer with enhanced solubility of the
photoexposed processed patterned positive photoresist layer within a solvent; and
stripping from the processed target layer the photoexposed processed patterned
positive photoresist layer while employing the solvent.
THE REFERENCES OF RECORD
As evidence of obviousness, the examiner relies upon the following references:
Wright et al. (Wright) 3,664,899 May 23, 1972
Liao et al. (Liao) 4,645,562 Feb. 24, 1987
Miyashita et al. (Miyashita) 5,380,608 Jan. 10, 1995
Sato et al. (Sato) 5,994,007 Nov. 30, 1999
THE REJECTIONS
Claims 1 through 7, 9 through 14, 16 through 26, 28 through 30 and 33 through
36 stand rejected under 35 U.S.C. §103(a) as being unpatentable over Liao in view of
Wright and Miyashita.1
Claims 8, 15 and 27 stand rejected under 35 U.S.C. §103(a) as being unpatentable
over Lao in view of Wright and Machete and further in view of Sat.
1Claims 31 and 32 have been cancelled.
3
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