Ex Parte DEBOER et al - Page 1




          The opinion in support of the decision being entered today was not written for
             publication in a law journal and is not binding precedent of the Board.  
                                                               Paper No. 25           


                      UNITED STATES PATENT AND TRADEMARK OFFICE                       
                                                                                     
                         BEFORE THE BOARD OF PATENT APPEALS                           
                                  AND INTERFERENCES                                   
                                                                                     
                              Ex parte SCOTT J. DEBOER                                
                               and HUSAM N. AL-SHAREEF                                
                                                                                     
                                Appeal No. 2001-2540                                  
                             Application No. 09/240,395                               
                                                                                     
                                      ON BRIEF                                        
                                                                                     

          Before THOMAS, KRASS and BARRY, Administrative Patent Judges.               
          KRASS, Administrative Patent Judge.                                         

                                 DECISION ON APPEAL                                   
               This is a decision on appeal from the final rejection of               
          claims 1-21.                                                                
               The invention concerns the fabrication of semiconductor                
          devices.  More particularly, a transition metal boride film is              
          used as a diffusion barrier in a gate stack disposed on a gate              
          dielectric.                                                                 


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