Ex Parte TENCH et al - Page 5




                Appeal No. 2002-0730                                                                                        5                  
                Application No. 09/410,250                                                                                                     


                on the grounds of anticipation and obviousness over Dubin alone or in view of Morrissey or                                     
                Lyde are not well founded.  Accordingly, we reverse these rejections.                                                          
                As an initial matter the appellants have stated that, A[t]hese claims do not stand or                                          
                fall together.@  See Brief, page 5.  The argument before us however, presents a single issue                                   
                with respect to claims 1 through 8 and 10 through 14 directed to the electrolytic solution,                                    
                and a separate argument with respect to claims 15 through 28 directed to a process for                                         
                electroplating.  Accordingly, we focus primarily on claims 1 and 15 and briefly address                                        
                claims 14, 18 and 21 as they are representative of separate rejections of record and limit                                     
                our consideration thereto.  See 37 CFR '1.192(c)(7) (2001).                                                                    
                               Rejection under 35 U.S.C. Section 102(b) over Lyde or Morrissey                                                 
                It is the basic premise of the appellants that, Aapplicants do not claim to have                                               
                invented highly complexed copper plating baths; rather, they have discovered an important                                      
                new utility for such a bath.  The applicants were the first to recognize that highly                                           
                complexed copper plating baths, prepared in accordance with the specification and as                                           
                recited in the present claims, offer significant advantages for copper chip plating.@  See                                     
                Brief, page 7.                                                                                                                 
                Indeed in order to clarify the differences over the prior art, the appellants required                                         
                that the electrolytic solution of claim 1 be used for a particular purpose, Aelectroplating                                    
                copper circuitry in trenches and vias in dielectric material on semiconductor chips.@  See                                     







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