Appeal No. 2003-0614
Application 09/520,591
means for determining an incoming angle of rotation on a
wafer at a first stage of wafer processing;
means for rotating the wafer to an outgoing angle of
rotation before moving into a second stage of wafer processing;
and
a computer arrangement that records the angle of rotation
and a corresponding wafer location in the wafer processing system
as the wafer moves through each stage of the processing system.
THE PRIOR ART
The references relied on by the examiner to support the
final rejection are:
Bacchi et al. (Bacchi) 5,511,934 Apr. 30, 1996
Tigelaar et al. (Tigelaar) 6,180,424 Jan. 30, 2001
THE REJECTIONS
Claims 1 through 26 stand rejected under 35 U.S.C. § 112,
first paragraph, as being based on a specification which fails to
comply with the enablement requirement.
Claims 1, 3, 16, 19 and 21 stand rejected under 35 U.S.C.
§ 102(e) as being anticipated by Tigelaar.
Claim 18 stands rejected under 35 U.S.C. § 103(a) as being
unpatentable over Tigelaar.
Claims 2, 4 through 15, 17, 20 and 22 through 26 stand
rejected under 35 U.S.C. § 103(a) as being unpatentable over
Tigelaar in view of Bacchi.
Attention is directed to the appellants’ main and reply
briefs (Paper Nos. 8 and 12) and to the final rejection and
2
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