Appeal No. 2003-0907
Application No. 09/337,278
affirm the rejection of claims 1 and 5 over the combination of Miyashita, Kanno and
Takehiko. The Examiner cited Takehiko for a teaching that it was known to use
CO2 to adjust resistivity of water to a range of 0.1 to 3.0 MS. (Answer, p. 7).
The Examiner rejected claims 3 and 7 under 35 U.S.C. § 103(a) as
unpatentable over the combination of Miyashita and Kanno, as applied to claims 1
and 5, further combined with Simmons; and claims 3 and 7 under 35 U.S.C.
§ 103(a) as unpatentable over the combination of Miyashita, Kanno and Takehiko,
as applied to claims 1 and 5, further combined with Simmons.
According to the Examiner, it would have been obvious to separate the
sponge member from the semiconductor device for cleaning. Specifically,
Simmons discloses that cleaning the brush/sponge causes contaminants to be
repelled from the brush/sponge, thus reducing load-up and extending the life of the
brush/sponge. (Answer, p. 8).
Appellants argue that the Simmons’ process raises the pH of the brushes and
does not suggest separating the object to be cleaned and that water is supplied to the
separated sponge.
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