Appeal No. 2003-1573
Application No. 08/854,407
“that it controls the anisotropy of the film” (Answer, page 9,
citing col. 4, ll. 28-33). Again we determine that this
“motivation” is not sufficient since the examiner has not presented
any convincing reasons for the combination of Cuomo with Bonyhard,
i.e., why would Bonyhard desire to control the anisotropy,
specifically to affect the perpendicular anisotropy of the film.
See In re Dembiczak, supra.
The examiner finds that Matsushita teaches a Fe-Al-Si-N film
sputtered from a FeAlSi alloy in a nitrogen-argon sputtering gas
(Answer, page 8). The examiner’s “motivation” for sputtering a
Sendust film including nitrogen is that it “provides good wear
resistance and high frequency soft range magnetism in VTR head
materials.” Answer, page 9. We determine that this “motivation”
is also insufficient since the examiner has not shown why one of
ordinary skill in this art would have modified the bias layer of
Bonyhard by use of a Sendust film including nitrogen as disclosed
by Matsushita. The examiner found that Bonyhard disclosed certain
alloys as the bias (or SAL) layer but failed to present any
findings that a Sendust alloy was disclosed/suggested (Answer, page
5, second full paragraph; see Bonyhard, col. 4, ll. 25-31). The
examiner found that Matsushita disclosed incorporating nitrogen
into a metal alloy used in general in “VTR head materials” (Answer,
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