The opinion in support of the decision being entered
today was not written for publication in a law journal
and is not binding precedent of the Board.
Paper No. 24
UNITED STATES PATENT AND TRADEMARK OFFICE
BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
Ex parte YOSHIKA KIMURA and TAKEO ISHIBASHI
Appeal No. 2004-1436
Application No. 09/583,865
ON BRIEF
Before KIMLIN, OWENS and TIMM, Administrative Patent Judges.
KIMLIN, Administrative Patent Judge.
DECISION ON APPEAL
This is an appeal from the final rejection of claims 1-12
and 19, all the claims remaining in the present application.
Claims 1 and 9 are illustrative:
1. A method for forming a resist pattern, comprising the
steps of:
pre-baking a semiconductor substrate having a surface to
which a resist has been applied;
forming a film on said resist comprising an overlying layer
material containing a water-soluble acid substance and a water-
soluble photo base generator
-1-
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