Appeal No. 2005-0713
Application No. 10/153,719 Page 2
BACKGROUND
The subject matter on appeal is directed to a plasma
processing apparatus for processing a microelectronic substrate
with enhanced plasma control (specification, paragraph 14). The
invention uses a radio frequency powered circuit having a minimum
of two adjustment capacitors interposed between a decoupling
capacitor and a radio frequency powered electrode (specification,
paragraph 15).
As a preliminary matter, we note appellant’s statement on p.
5 of the brief that the claims do not stand or fall together.
However, only claim 11 is argued separately with respect to the
examiner’s first and third stated rejection. Therefore, for
purposes of this appeal, we select claim 1 as representative of
claims 1-3, 5, and 12 grouped on appeal as in the examiner’s first
and third stated rejection and we decide the propriety of the
examiner’s rejections of those claims based on representative
claim 1 pursuant to 37 CFR § 1.192(c)(7). Claim 4 separately
rejected. Thus, claim 4 is separately considered. An
understanding of the invention can be derived from a reading of
exemplary claims 1, 4, and 11 which are reproduced below.
1. A plasma processing apparatus comprising:
a reactor chamber,
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