Appeal No. 2005-0713
Application No. 10/153,719 Page 3
a radio frequency powered electrode contained
within the reactor chamber;
a radio frequency power circuit powering the radio
frequency powered electrode, wherein the radio frequency
power circuit comprises:
a radio frequency power source separated from the
radio frequency powered electrode by a decoupling
capacitor in series; and
a minimum of two adjustment capacitors interposed
between the decoupling capacitor and the radio frequency
powered electrode, one terminal of each of the
adjustment capacitors being electrically connected with
one terminal of the decoupling capacitor and the other
terminal of each of the adjustment capacitors being
connected to ground.
4. The apparatus of claim 3 wherein the plasma
etching apparatus comprises a plasma reactant gas ring
assembled to the radio frequency powered electrode.
11. The apparatus of claim 1 wherein the decoupling
capacitor is a single decoupling capacitor.
REFERENCES
The prior art references of record relied upon by the
examiner in rejecting the appealed claims are:
Nakano 6,270,618 Aug. 7, 2001
Singh 6,042,687 Mar. 28, 2000
Nguyen 5,244,730 Sep. 14, 1993
Gesche 5,140,223 Aug. 18, 1992
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