Appeal No. 2006-0741
Reexamination Control No. 90/006,185
(c) measuring said intensity as a function of
wavelength;
(d) providing a model structure on a data processing
machine, said model structure comprising a repeating
structure on said substrate, said model structure comprising
a model profile, wherein said model profile comprises an
edge having more than one X position;
(e) mathematically predicting a predicted diffracted
radiation intensity when said model structure is illuminated
with said radiation; and
(f) comparing said predicted intensity with said
measured intensity.
27. A method of determining the profile of a repeating structure
comprising the steps of:
(a) providing a substrate having a plurality of lines
having substantially identical line profiles and spacings;
(b) illuminating said lines with radiation having a range
of wavelengths, wherein said radiation reflects with an
intensity as a function of wavelength;
(c) selecting a polarization state of said reflected
radiation;
(d) measuring the intensity of radiation reflected from
said lines as a function of wavelength;
(e) providing a model of the line profile and line
spacing, wherein said model of the line profile comprises an
edge having more than one X position;
(f) mathematically predicting the intensity of radiation
that would be reflected from the model as a function of
wavelength; and
(g) comparing the predicted intensity with the
measured intensity; and
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