Appeal No. 2006-0741
Reexamination Control No. 90/006,185
(h) adjusting the model and repeating steps (f) and (g)
to improve agreement in said comparing step (g).
28. An apparatus for determining the profile of a line on a substrate, the
apparatus comprising:
a radiation source for illuminating the substrate with
radiation, said substrate comprising a repeating structure,
said repeating structure comprising a plurality of lines and
spaces between said lines, said lines having substantially
the same line profile, said spaces being substantially
identical, the illuminating of the repeating structure for
obtaining diffraction of said radiation, wherein said diffracted
radiation has an intensity as a function of wavelength;
a polarizer for selecting a single polarization state of
diffracted light;
a detector for measuring said intensity as a function of
wavelength;
a data processing machine comprising a computer
model structure, said model structure comprising a model
repeating structure on a model substrate, said repeating
structure comprising a plurality of model lines and model
spaces between said model lines, said model lines having
substantially the same model line profile, each said model
line comprising an edge having more than one X position,
said model spaces being substantially identical, said data
processing machine for mathematically predicting a
predicted diffracted radiation intensity when said model
structure is illuminated with said radiation source;
said data processing machine further comprising
means for comparing said predicted intensity with said
measured intensity; and
said data processing machine further comprising
means for adjusting said model structure and for repeating
said predicting and comparing steps to improve agreement
in said comparing step.
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