Appeal 2006-1582
Application 10/126,350
BACKGROUND
Appellants’ invention relates to a plasma-induced chemical vapor deposition (CVD)
process for uniformly coating bodies having two open ends. Representative claim 1, as
presented in the appendix to the brief, appears below:
1. A plasma-induced chemical vapor deposition (CVD) process for
uniformly coating hollow bodies having two open ends, comprising the steps of
a) closing off one open end of the hollow body in a gas-tight manner by
a cover;
b) introducing the hollow body into a plasma-induced CVD reactor;
c) applying vacuum to the hollow body via other open end and
establishing a homogeneous coating temperature to generate plasma-induced
coating of uniform thickness on the interior surface of the hollow body.
As evidence of unpatentability the Examiner relies upon the following references:
Burns US 5,232,111 Aug. 3, 1993
Mahulikar US 5,741,544 Apr. 21, 1998
Mummolo US 5,967,191 Oct. 19, 1999
Martin US 6,001,429 Dec. 14, 1999
Cui US 6,148,764 Nov. 21, 2000
The Examiner rejected claims 1 and 4 under 35 U.S.C. § 103(a) as obvious over Martin
in view of Mahulikar; claim 2 stands rejected under 35 U.S.C. § 103(a) as obvious over the
combined teachings of Martin, Mahulikar, and Burns; claim 3 stand rejected under
35 U.S.C. § 103(a) as obvious over the combined teachings of Martin, Mahulikar, and
Mummolo; claims 1 and 4 stand rejected under 35 U.S.C. § 103(a) as obvious over the
combined teachings of Mahulikar and Cui; claim 2 stands rejected under 35 U.S.C. § 103(a) as
2
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