Appeal 2007-0108
Application 10/698,884
providing a donor compound suspended in a carrier gas, the donor
compound including the one or more elements for deposition;
passing the carrier gas with the suspended donor compound over the
substrate so as to form a film of the donor compound on the substrate; and
irradiating the donor compound with optical radiation having an
intensity sufficient to cause deposition of the one or more elements onto the
substrate through photochemical decomposition of molecules of the donor
compound within the film formed on the substrate,
wherein the intensity of the optical radiation is insufficient to cause
significant photolytic breakdown of molecules of the donor compound that
are suspended in the carrier gas.
23. A method of depositing at least one element on a substrate, the
method comprising the steps of:
providing a donor compound suspended in a carrier gas, the donor
compound including the element for deposition;
passing the carrier gas with the donor compound over the substrate so
as to form a film of the donor compound on the substrate; and
irradiating the donor compound with optical radiation so as to cause
deposition of the element onto the substrate through photochemical
decomposition of molecules of the donor compound within the film on the
substrate,
wherein the optical radiation has a pulse width that is insufficient to
cause thermal absorption by the element so as to prevent thermally induced
breakdown of the donor compound.
The Examiner relies upon the following references as evidence of
obviousness:
Morishige US 4,711,790 Dec. 8, 1987
Polyanyi US 6,319,566 B1 Nov. 20, 2001
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