Appeal No. 2006-3351
Application No. 10/011,882
Johansson describes Figure 4 as follows:
Fig. 4 shows a view of a portion of a
substrate 401 from above in which a
preferred pattern of trenches 403 has been
etched. The trench pattern is then used
under an inductor for reducing the losses
to the substrate. The pattern comprises a
first set of several straight identical
trenches located in parallel to each other
and having an equal spacing and also a
second set of identical trenches located
in parallel to each other and equally
spaced, the trenches of the second set
being perpendicular to those of the first
set [Johansson, Page 9, middle].
From the above paragraph, we find evidence that it
was within the prior art at the time of filing that
both sets of perpendicular trenches would be at the
same depth. Johansson teaches that “. . . a preferred
pattern of trenches 403 has been etched.” A person of
ordinary skill in this art would produce this single
pattern, comprising both sets of trenches, by a single
set of etching operations as described in Johansson on
page 3, middle. Certainly, if any more complicated
etching operation were intended by Johansson, leading
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