Appeal 2007-0096
Application 09/969,467
embodiment(s) employing UV irradiation and vapor (steam) as taught by
Miki.
We determine that the Examiner has reasonably established that the
UV irradiation, as taught by Miki, would have implicitly resulted, prima
facie, in an increase in hydroxyl radicals in the vapor/steam used in the
wafer cleaning of Miki. Appellant has not refuted the prima facie case of
obviousness presented. Accordingly, we determine that the appealed claims
are obvious, within the meaning of § 103(a), over the applied prior art. It
follows that we shall sustain the Examiner’s obviousness rejection.
DECISION
The decision of the Examiner to reject claims 1, 3-6, and 8 under
35 U.S.C. § 103(a) as being unpatentable over Miki in view of Pokharna is
affirmed.
No time period for taking any subsequent action in connection with
this appeal may be extended under 37 C.F.R. § 1.136(a)(1)(iv).
AFFIRMED
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Dallas, TX 75265
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