Ex Parte Kiser et al - Page 8

                Appeal 2007-1943                                                                               
                Application 10/443,649                                                                         
                HT chamber pressure       A. 800-1,500 psi;         500-1,500 psig (broad)3                    
                                          (Claim 6;                         600-1200 psig (prefer) 4           
                                          p. 4, ll. 22-25;          (col. 3, ll. 4-9, “as taught               
                                          p. 5, ll. 22-25)                  in U.S. Pat. No.                   
                                                                     4,075,084 to Skripek”)                    
                                          B. about 1,100 psi                                                   
                                           (Claim 16)                                                          
                                          C. 1000-5000 psig,                                                   
                                          preferably, 1500-3500 psig,                                          
                                           most pref., 1,400-1,500 psig                                        
                                           (p. 5, ll. 1-6)                                                     
                HT chamber temp.          A. 500oF                 500-800oF (broad)5                         
                                          (p. 4, ll. 24-25)                600-750oF (prefer)6                 
                                                                              (col. 3, ll. 4-9, “as taught     
                                                                    in U.S. Pat. No.                           
                                                                     4,075,084 to Skripek”)                    
                                          B. about 300oC to 450oC,                                             
                                           preferably                                                          
                                           about 350oC to 400oC                                                
                                           (p. 5, ll. 1-6)                                                     
                                                                                                              
                3     Didchenko’s HT chamber pressure is taken from Skripek, U.S.                              
                4,075,084, patented February 21, 1978, col. 3, Table at ll. 50-55 thereof.                     
                The Examiner cited Skripek and relied upon its disclosure for Didchenko’s                      
                HT conditions and catalysts (Answer, p. 3).                                                    
                4     Didchenko’s preferred HT chamber pressure is taken from Skripek,                         
                U.S. 4,075,084, patented February 21, 1978, col. 3, Table at ll. 50-55                         
                thereof.  The Examiner cited Skripek and relied upon its disclosure for                        
                Didchenko’s HT conditions and catalysts (Answer, p. 3).                                        
                5     Didchenko’s HT chamber temperature is taken from Skripek, U.S.                           
                4,075,084, patented February 21, 1978, col. 3, Table at ll. 50-55 thereof.                     
                The Examiner cited Skripek and relied upon its disclosure for Didchenko’s                      
                HT conditions and catalysts (Answer, p. 3).                                                    
                6     Didchenko’s preferred HT chamber temperature is taken from                               
                Skripek, U.S. 4,075,084, patented February 21, 1978, col. 3, Table at ll. 50-                  
                55 thereof.  The Examiner cited Skripek and relied upon its disclosure for                     
                Didchenko’s HT conditions and catalysts (Answer, p. 3).                                        
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