Appeal 2007-2185
Application 10/614,992
INTRODUCTION
Appellants’ disclosed invention relates to (1) an improved susceptor
which inhibits the deposition of process gases on the edge and backside of a
substrate, and which may be easily removed and cleaned and (2) a method
therefore (Specification ¶ [0002], claims 3 and 17). Appellants’ structure for
preventing the deposition includes a purge ring 15, with alignment slots 6 on
the substrate support 13, and a shadow ring 4 with pins 19 for cooperating
with the alignment slots 6 (Figures 7 and 10; claim 3).
3. An apparatus comprising:
a) a substrate support;
b) a first edge ring disposed on the substrate support, the first edge
ring having one or more tapered recesses; and
c) a second edge ring having one or more matching tapered pins for
mating engagement with the one or more tapered recesses of the first edge
ring, wherein the first edge ring comprises a purge ring.
The Examiner relies on the following prior art references as evidence
of unpatentability:
Cheng EP 553,691 A1 Aug. 4, 1993
Koai US 6,159,299 Dec. 12, 2000
The rejections as presented by the Examiner are as follows:
1. Claims 3-6, 8-14, and 17-25 are rejected under 35 U.S.C. § 102(b) as
being unpatentable over Cheng.
2. Claims 3-6, 8-14, and 17-25 are rejected under 35 U.S.C. § 102(b) as
being unpatentable over Koai.
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