Ex Parte Baluswamy - Page 4

               Appeal  2007-3372                                                                            
               Application 10/651,351                                                                       
               The analysis supporting obviousness should be made explicit and should                       
               “identify a reason that would have prompted a person of ordinary skill in the                
               art to combine the elements” in the manner claimed.  KSR Int’l Co. v.                        
               Teleflex, Inc., 127 S. Ct. 1727, 1731, 82 USPQ2d 1385, 1389 (2007).                          
               § 103(a) Rejection over Takahashi taken with Yasuzato.                                       
                      Appellant argues claims 1, 2, 4, 9 and 10 together as a group.  We                    
               select claim 1 as the representative claim for this claim grouping.                          
                      The Examiner has determined that Takahashi discloses much of the                      
               representative claim 1 method step requirements but that “[t]he difference                   
               between the claims and Takahashi is that Takahashi does not disclose that                    
               the projected pattern image is focused at approximately mid-depth of the                     
               photoresist on the substrate” (Answer 4 and 5).                                              
                      The Examiner further relies on Yasuzato as evidence of the                            
               obviousness of the subject matter of representative claim 1.  The Examiner                   
               contends that it would have been obvious to one of ordinary skill in the art at              
               the time of the invention “to modify Takahashi by employing the method of                    
               focusing the light to ... mid-depth of the photoresist as suggested by                       
               Yasuzato because Yasuzato, in col. 5, lines 46-54, and in col. 6, lines 1-13,                
               discloses that increasing the depth of focus enables the precision of the                    
               pattern dimension to be enhanced” (Answer 5).                                                
                      Appellant does not dispute that Takahashi taught or would have                        
               suggested the representative claim 1 method but for the focus location                       
               (approximately mid-depth of the photoresist) of the step of focusing the                     
               altered image pattern as required by appealed claim 1 (Br. 5-9; Reply Br. 2-                 




                                                     4                                                      

Page:  Previous  1  2  3  4  5  6  7  8  9  10  11  12  Next

Last modified: September 9, 2013