Appeal No. 94-0809
Application 07/707,365
having source and drain regions by oxidizing doped polysilicon
plugs and/or by implanting dopant impurities into polysilicon
plugs and diffusing impurities from polysilicon plugs into a
substrate (Ans., p. 5, final two para.). What the examiner has
not explained and we do not find apparent is a reason why a
person having ordinary skill in the art would have sought to
alter Nishizaka’s device in a manner inconsistent with its design
to function in a manner which undermines its advantages.
3. Conclusion
Accordingly, we reverse the examiner’s rejection of
Claims 1-3 and 6 under 35 U.S.C. § 103 in view of the combined
teachings of Nishizaka, Godejahn and O’Mara.
REVERSED
Teddy S. Gron )
Administrative Patent Judge )
)
)
)
Chung K. Pak ) BOARD OF PATENT
Administrative Patent Judge ) APPEALS AND
) INTERFERENCES
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)
Terry J. Owens )
Administrative Patent Judge )
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