Appeal No. 94-2080 Application 07/982,068 canceled. No claim has been allowed. References relied on by the Examiner Castrucci et al. (Castrucci) 3,785,886 Jan. 15, 1974 Wickstrom 4,070,690 Jan. 24, 1978 Imaizumi et al. (Imaizumi) 4,278,987 Jul. 14, 1981 The Rejections on Appeal Claims 7-11 stand finally rejected under 35 U.S.C. § 112, first paragraph, as being without written description in the specification. Claims 7-11 stand finally rejected under 35 U.S.C. § 103 as being unpatentable over Wickstrom, Imaizumi, and Castrucci. The Invention The invention is directed to a vertically oriented insulated gate field effect transistor formed on a semiconductor substrate having a (100) principal plane. A rectangular recess is formed such that at least two side walls thereof make a 45 degree angle against the (01ù) plane of the substrate. Claim 10 appears the broadest and is reproduced below: 10. A power vertical insulated gate FET comprising: a silicon substrate of high concentration n-type conductivity having a principal (100) plane, an epitaxially grown lower concentration n-type epitaxial layer on said substrate, 2Page: Previous 1 2 3 4 5 6 7 8 9 10 11 12 13 NextLast modified: November 3, 2007