Appeal No. 95-4663
Application 08/044,487
The references of record relied upon by the examiner are:
Renner 4,371,605 Feb. 1, 1983
Uetani et al. (Uetani) 0 460 416 A1 Dec. 11, 1991
(European Patent)
Lamola et al. (Lamola), Solid State Technology, ?Chemically
Amplified Resists?, No. 8, pages 53-60 (1991).
The appealed claims stand rejected for obviousness (35 USC
§ 103) over Uetani in view of Lamola and Renner.
We reverse.
The subject matter on appeal is directed to a chemically
amplified positive photoresist composition useful in deep2
ultraviolet lithography which composition includes an alkali-
soluble resin (referred to as a novolak resin), a dissolution
inhibitor and a photo-induced acid precursor. The alkali-soluble
novolak resin is produced through a condensation reaction of an
aldehyde with a phenol compound, including a compound of general
2 The phrase ?chemically amplified resist? is a coined term which has been
defined as a resist material in which exposure, followed by a post exposure bake,
results in the formation of a catalytic photoproduct, the three-dimensional
distribution of which defines the latent image. See page 54, the first full
paragraph of Lamola.
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