Appeal No. 95-4663
Application 08/044,487
formula (I) as set forth in appealed claim 1. The positive
photoresist composition of the present invention is said to
exhibit advantageous resolution, profile and sensitivity
properties.
The examiner’s prima facie case of obviousness is predicated
on the contention that it would have been obvious to a person of
ordinary skill in the art to modify the photoresist composition
taught by Uetani by using the dissolution inhibitor taught by
Lamola and the photoinduced acid precursor taught by Renner to
produce a positive photoresist composition, because each
component is used for its intended purpose and one would expect
that ?known components used in positive photoresists compositions
would perform in known and expected manners?. See the Answer at
pages 3 and 4. In support of this rejection the examiner
correctly factually determined that Uetani teaches a positive
photoresist composition containing an alkali soluble novolak
resin which is identical to the claimed alkali-soluble resin
(i.e., an alkali-soluble resin obtained through a condensation
reaction of an aldehyde with a phenol compound including a
compound of general formula (I) as recited in claim 1). However,
a quinone diazide compound is also an essential component of the
radiation-sensitive composition disclosed by Uetani. See Uetani
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