Appeal No. 95-4663
Application 08/044,487
at page 2, line 56 to page 3, line 27. Thus Uetani’s composition
may be characterized as a positive-tone resist containing a
diazonaphthoquinone photoactive component (PAC) in combination
with a novolak resin which is referred to in the prior art as a
?PAC/novolak resist?. See Lamola at page 53, column 1, first
full paragraph.
Lamola describes a three component positive photoresist,
much like the photoresist claimed herein, which contains an
alkali soluble resin, a dissolution inhibitor and a photo-induced
acid precursor. See page 55 of Lamola. However, with respect to
the alkali soluble resin, Lamola indicates (page 55, second
column, last paragraph) that it is not a ?coincidence? that all
examples described of chemically amplified resist are based on
phenolic polymers rather than novolak resins. In fact, Lamola
indicates that while novolak resins with improved transparency
have been developed for such systems, the transparency
improvement is not adequate and the high nonbleachable absorption
properties precludes the use of such novolaks in certain systems.
See page 56, first full paragraph of the reference. Lamola also
expressly indicates that the chemically amplified resists
described are useful for deep ultraviolet lithography. However,
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