Appeal No. 95-2413
Application 07/936,865
BARRETT, Administrative Patent Judge.
DECISION ON APPEAL
This is a decision on appeal under 35 U.S.C. § 134 from
the final rejection of claims 13-18, 22, and 29-62.
Claims 1-12, 25, and 26 are indicated to be allowed.
We affirm-in-part.
BACKGROUND
The disclosed invention is directed to a sputtering
apparatus and method having a rotatable array of magnets
arranged in a geometry that provides a selected erosion
profile.
Claims 34 and 36 are reproduced below.
34. A magnetron sputtering apparatus comprising:
a vacuum chamber;
a target cathode in said vacuum chamber having a
smoothly continuous concave closed front surface from
which material is to be sputtered and a back surface; and
a rotatable magnet means for generating a single
magnetic field over said front surface, said magnet means
being positioned behind said back surface.
36. A sputter source comprising:
a vacuum chamber,
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