Appeal No. 96-0377 Application 07/979,254 still is reasonably pertinent to the particular problem with which the inventor is involved. In re Clay, supra. With respect to the field of endeavor, we agree with the Examiner. Since Steinberg and Appellants’ invention are classified in the very same class and subclass in the Patent Office Manual of Classification, i.e., Class 156 subclass 345, Differential Etching Apparatus, there is little dispute that they are in the same field of endeavor. We need go no further to answer the second question of the particular problem which is involved. Combinability Appellants argue on pages 8 and 9 of the brief: In this regard, the unobvious-ness under 35 USC § 103 of the invention defined in claims 1 and 9 over the applied references is strongly reflected by the fact that none of the references address or in any way appreciate the particular charge buildup problem of coaxial plasma processing apparatus which is addressed and advantageously overcome by the invention of the independent claims. And in their reply brief at page 2: 6Page: Previous 1 2 3 4 5 6 7 8 9 10 NextLast modified: November 3, 2007