Appeal No. 96-1249
Application 08/270,215
to col. 7, line 6). A layer of palladium can be deposited
directly on the transparent electroconductive layer (e.g., an
indium oxide layer) in order to prevent "degradation" thereof:
The transparent electroconductive laminate
according to the present invention can be coated
with a thin layer of at least one of metal
and/or metal oxide selected from a group
consisting of palladium, platinum, ruthenium,
osmium, iridium, rhodium, gold, cobalt, silver,
nickel, tungsten, iron and tin either on the
above-mentioned transparent electroconductive
layer directly or on the above-mentioned
polymeric layer containing the fine particles.
The thin layer of at least one metal and/or
metal oxide selected from the group consisting
of platinum, palladium, ruthenium, osmium,
iridium and rhodium is more preferable. The
metal and/or metal oxide can be used singly or
as a mixture. The metal and/or metal oxide
layer can also be used as a laminated structure.
The thickness of the metal and/or metal
oxide layer is preferably more than 0.5 D and
less than 20 D. A thickness of less than 0.5 D
is not effective in preventing degradation of
the transparent electroconductive layer. On the
other hand, a thickness of more than 20 D is
not preferable since the transparency is
decreased. [Our emphasis.] [Col. 9, lines 7-
27.]
Although Mikoshiba does not state that the foregoing
teaching of depositing a metal and/or metal oxide layer on the
transparent electroconductive layer is limited to laminates
for use in electroluminescent displays, we agree with
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