Appeal No. 96-1249
Application 08/270,215
appellants that this is implied by the discussion of Examples
10-23 (col. 16, line 44 to col. 17, line 41), which are only
examples employing such metal and/or metal oxide layers. In
each of those examples, "a hardened layer of the organosilicic
compound was formed on the both sides of the surface of a 75
Fm thick polyethylene terephthalate film and then an indium@tin
oxide layer with a thickness of 250 D was deposited on one
surface of the hardened organosilicic compound layer" (col.
16, lines 44-51). Next, using a different metal or alloy for
each example (see col. 17, Table 6), a layer of the metal or
metal alloy about 2 D thick was formed on the indium@tin oxide
layer, coated with the coating liquid used in Example 5, and
then heated in order to produce a transparent
electroconductive laminate (col. 16, lines 52-63). This
transparent electroconductive laminate was then laminated to
the emitting layer of a test sheet of the type described in
Example 4, which is an aluminum sheet coated with insulating
layer and a coating containing phosphor powder (col. 13, line
58 to col. 14, line 13), to form a sample for a degradation
test (col. 16, lines 64-68). After the attachment of suitable
electrodes and power terminals, "[a]n electrical power of 100
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