Appeal No. 96-3652
Application No. 08/348,820
article and nozzle in a direction transverse to the slit to
form a barrier layer on the glass article.
Mizuhashi is relied upon by the examiner for disclosing a
method of forming a silicon oxide barrier layer via a chemical
vapor deposition (CVD) process that involves hydrogen gas
incorporation therein via “contacting hydrogen gas with the
gas of a silicon compound capable of forming silicon oxide...”
(answer, page 3).
According to the examiner, claim 1 (the sole independent
claim on appeal) “differs from Mizuhashi in reciting that the
process is carried out at atmospheric pressure and that the
precursors are applied by the use of a projection nozzle”
(answer, page 4). To remedy the deemed deficiencies of
Mizuhashi that are asserted by the examiner, the examiner
relies on the teachings of Yamazaki with respect to using a
projection nozzle in forming a boro-silicate coating via a CVD
method, maintaining a 5 to 40 mm distance between such a
nozzle and a substrate and maintaining movement between the
nozzle and substrate. The examiner states that “it would have
been obvious to one of ordinary skill to use the apparatus of
Yamazaki et al. to apply the coating of Mizuhashi et al. with
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Last modified: November 3, 2007