Appeal No. 96-3652 Application No. 08/348,820 the expectation of obtaining similar results” (answer, page 4). However, we note that the examiner does not address or explain where the claimed ternary gas mixture including a major portion of a neutral gas can be found in Mizuhashi or why it would have been obvious to use such a ternary mixture in Mizuhashi from the combined reference teachings. Moreover, without pointing to any teaching of the references for support, the examiner asserts that optimizing the pressure of the CVD method of Mizuhashi would have been obvious to one of ordinary skill in the art through routine experimentation (answer, page 3). In addition, the examiner has not pointed to where the references furnish a suggestion or motivation for using the CVD apparatus disclosed by Yamazaki for use in depositing a zinc borosilicate film as the apparatus for depositing the silica- based barrier layer of Mizuhashi on a substrate in the manner recited in the appealed claims. In this regard, we note that Yamazaki teaches away from use of a silicon oxide film (column 1, lines 55-60) and suggests that the injection nozzle structure is designed for use when diborane and silane are used as raw materials in forming the 6Page: Previous 1 2 3 4 5 6 7 8 9 10 NextLast modified: November 3, 2007