Appeal No. 1997-2023
Application No. 08/197,497
invention (Final Rejection dated May 3, 1995, Paper No. 13, page
2).
According to appellants, the invention is directed to a
method of forming an aluminide diffusion coating including an
additive element by chemical vapor deposition on a substrate
where first and second sources comprising aluminum and an
additive element are disposed outside the coating retort (Brief,
page 1).1 Claim 1 is illustrative of the subject matter on
appeal and a copy of this claim is reproduced below:
1. A method of forming by chemical vapor
deposition on a substrate an aluminide diffusion coating
including an additive element, comprising flowing a first
halide precursor gas in a carrier gas in contact with
a first source comprising aluminum disposed outside a
coating retort to generate an aluminum halide first
coating gas, flowing a second halide precursor gas in a
carrier gas in contact with a second source comprising
the additive element disposed outside the coating retort
to generate a second halide coating gas, and introducing
the first and second coating gases concurrently into
a coating retort in which the substrate at coating
temperature is disposed to codeposit aluminum and
1It is noted that “Appellants’ Response to Examiner’s
Answer” (hereafter “Response”) dated Mar. 20, 1996, Paper No. 21,
was refused entry by the examiner (Supplemental Examiner’s Answer
dated Sep. 16, 1996, Paper No. 22). Since the time period for
appellants’ petition under 37 CFR § 1.181 of this refusal has
expired, appellants’ Response has not been considered as part of
the appeal record.
2
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