Appeal No. 1997-2209
Application No. 08/179,196
the “Second Response to Final Office Action” filed September
16, 1996 (Paper No. 18), which the examiner entered.
The subject matter on appeal is directed to a positive
photoresist composition which includes: (i) a copolymer of p-
vinylphenol, p-t-butoxycarbonyloxystyrene, and styrene, which
satisfy the relative ratio limitations recited in appealed
claim 1; (ii) a dissolution inhibitor of formula [II] as
recited in appealed claim 1; and (iii) a photo-induced acid
precursor (brief, page 3). This appealed subject matter is
adequately illustrated by independent claim 1, which reads as
follows:
1. A positive photoresist composition comprising an
alkal i-soluble resin
conta ining a copolymer of
p- vinylphenol, p-t-
butox ycarbonyloxystyrene
and styrene; a
disso lution inhibitor; and
a photo-induced acid
precu rsor, wherein the
numbe r of p-vinylphenol
(m), the number of p-t-
butox ycarbonyloxystyrene
(p), and the number of styrene (n) satisfy the following
conditions:
(m + p):n = from 50:50 to 95:5 and
p:(m + p) = from 1:50 to 45:50; and
wherein said dissolution inhibitor is a compound
represented by the following formula (II):
2
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