Appeal No. 1997-3769
Application 08/418,257
periodically interrupting said continuing step for a
first time period.
The examiner relies on the following references:
Armstrong 4,994,162 Feb. 19,
1991
Wolf et al., "Aluminum Thin Films and Physical Vapor
Deposition in VLSI", Silicon Processing for the VLSI Era, pgs.
332-334 and 367-374 (1986).
In addition, the examiner relies on admitted prior art
[APA] . 1
Claims 1, 3-11 and 18-28 stand rejected under 35 U.S.C.
§ 103 as unpatentable over the combination of Armstrong, APA
and Wolf.
All of the claims also stand rejected under the doctrine
of obviousness-type double patenting over claim 11 of U.S.
1While the examiner indicates the admitted prior art
relied upon to be that set forth at page 7, line 16 through
page 8, line 2 of the instant specification, this is clearly
in error as that part of the specification merely describes
the drawing figures. Apparently, the examiner is relying on
the description of the prior art which appears at pages 3-5 of
the instant specification.
-3-
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