Ex parte EVANS et al. - Page 5




          Appeal No. 1997-3915                                                        
          Application No. 08/640,572                                                  


               The examiner states (Answer, page 4) that it would have                
          been obvious in view of Miller and Swartz to use Pb(Mg Nb )O                
                                                                1/3 2/3 3             
          for the ferroelectric material of Shirasaki, as Swartz also                 
          lists Pb(Mg Nb )O  as a known PLZT ferroelectric material.  The             
                     1/32/3 3                                                         
          examiner points to Pb(Mg Nb )O  because it includes niobium                 
                                  1/32/3 3                                            
          (one of the materials disclosed by appellants as an appropriate             
          dopant).  Appellants argue (Brief, page 3) that neither Swartz              
          nor Miller provides motivation for using any of the compositions            
          taught therein in a ferroelectric FET memory device such as that            
          of Shirasaki.  However, though all recitations of Pb(Mg Nb )O               
                                                                 1/3 2/3 3            
          and other materials including niobium, tantalum, or tungsten                
          (appellants' disclosed dopants) are for applications other than             
          memory devices, as stated above, both Swartz and Miller indicate            
          that certain compositions are useful for memory structures.                 
          Accordingly, although we agree that neither Swartz nor Miller               
          suggests using Pb(Mg Nb )O , or other compositions including                
                              1/3 2/33                                                
          niobium, tantalum, or tungsten, in a ferroelectric FET memory               
          device, it would have been obvious to combine the compositions              
          of Swartz and Miller disclosed as being appropriate for memory              
          devices with Shirasaki's FET memory device.                                 


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