Ex parte SHELL et al. - Page 8




               Appeal No.  1997-3916                                                                                               
               Application No.  08/429,650                                                                                         


               Appellants assert (brief, page 10), that there is no description or teaching in the reference of an anti-           

               punchthrough region narrower than the gate electrode.  Appellants argue (brief, page 11) that:                      

                       On reviewing the Kubo patent, however, one of ordinary skill in the art finds no clear                      
                       teachings regarding the size of an anti-punchthrough region.  Rather, one of ordinary skill                 
                       finds a jumble of poorly drawn, schematic figures that convey no clear teachings as to the                  
                       size of an anti-punchthrough region.  One of ordinary skill, upon finding no clear teachings                
                       related to the size of buried anti-punchthrough regions in the figures of the Kubo patent                   
                       could continue to the text of the Kubo patent and find a complete  lack of teachings as to                  
                       the relative size of the anti-punchthrough region and the gate in the specification of the                  
                       Kubo patent.                                                                                                

                       Thus, the issue before us is whether Kubo teaches or suggests forming a buried anti-punchthrough            

               implant channel that is narrower than the gate electrode.  Based upon the opposing arguments found in the           

               brief and the answer, we find this disputed issue of fact to be close; but on the balance, we find that Kubo        

               does not teach or suggest forming a buried anti-punchthrough layer that is narrower than the gate                   

               electrode, for the following reasons.                                                                               

                       From our review of Kubo, we agree with the examiner that figures 1 and 10 of Kubo, as well as               

               figures 2A, 2B, 12A-12D and 13-15 appear to illustrate buried layer (1C) to be narrower than the                    

               electrode (3); whereas figures 3-9, as well as figure 11 appear to illustrate the buried layer (1C) to be           

               wider than electrode (3).  However, we are in agreement with appellants (brief, pages 11 and 12) that the           

               figures of Kubo are too variable and schematic in nature, and provide no clear teaching as to the size of the       

               buried anti-punchthrough implant channel.  For example, as illustrated in the drawings of Kubo, measuring           

               the size of various elements found in the drawings, we find that in figure 1, buried layer (1C) is 10 mm            

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