Appeal No. 1998-1211
Application No. 08/448,955
Flamm et al. (Flamm) 4,918,031 Apr. 17, 1990
Fujii 3-241752 Oct. 28, 1991
(Japanese Kokai patent application)
The present application is a division of U.S. Application
No. 08/375,138, filed January 19, 1995. The parent and
instant applications are presently before us on appeal. The
claims of the parent application are directed to a homogeneous
marker in a deposited layer that is used to control etching of
the layer, whereas the claims in the instant application are
directed to a method of making a semiconductor device by the
reactive ion etching of a deposited layer that contains a
homogeneous marker or a plurality of same.
Appealed claims 4-7, 12 and 15-27 stand rejected under
35 U.S.C. § 103 as being unpatentable over Flamm in view of
Fujii.
Upon careful consideration of the opposing arguments
presented on appeal, we will not sustain the examiner's
rejection of claims 4-6 and 15-25 under 35 U.S.C. § 103.
However, we will sustain the examiner's § 103 rejection of
claims 7, 12, 26
and 27.
-3-
Page: Previous 1 2 3 4 5 6 7 8 Next
Last modified: November 3, 2007