Appeal No. 1997-3304 Page 3
Application No. 08/181,936
BACKGROUND
The appellants' invention relates to a chemical vapor
deposition trap used during manufacture of semiconductor
wafers (specification, p. 1). A copy of the claims under
appeal is set forth in the appendix to the appellants' brief.
The prior art references of record relied upon by the
examiner in rejecting the appealed claims are:
Konno et al. (Japan'833) 1-312833 Dec. 18, 19892
(published unexamined Japanese patent application)
Philipossian 4,950,156 Aug. 21, 1990
In a new ground of rejection, infra, we rely upon the
following prior art:
Appellants' prior art disclosure (specification, pages 1 and
2)
Claims 1 through 14, 17 and 18 stand rejected under
35 U.S.C. § 103 as being unpatentable over Japan'833 in view
of Philipossian.
Our understanding of this reference is based on a translation obtained by2
the U.S. Patent and Trademark Office. A copy of the translation is attached
hereto for appellants' convenience.
Page: Previous 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 Next
Last modified: November 3, 2007